Structural and Electrical Characterization of Materials
Reliability study of MOS devices subjected to electrical stress.
Study of semiconductor memory devices using nanocrystals.
Study of semiconductors and Si and III-V devices.
Fabrication and study of electroluminescent displays and electroluminescent devices.
Electrical characterization of carbon membranes for microelectronics applications.
Development, structural, and electrical characterization of MOS devices containing high-k gate dielectric materials and next-generation DRAM memories.
Study of MOS devices based on Germanium (Ge) where a rare earth oxide is used as a first isolation layer dielectric for use in upcoming generations of CMOS devices.